Inventor
David J. Luca
Inventor
Rochester, NY, US
Overview
Patents· 30 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices21%
B41JTypewriters18%
C08LCompositions of macromolecular compounds10%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds9%
Y10TTechnical subjects covered by former us classification8%
G03GElectrography6%
B41MPrinting, duplicating, marking, or copying processes5%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds4%
C08JWorking-up4%
PatentTitleYear
6,972,304'Aqueous ink compositions'20056,871,945'Ink jet printing process'20056,605,236'Conductive polymeric composites, articles and processes for the preparation thereof'20036,547,380'Ink jet printing process'20036,485,130'Bonding process'20026,323,301'High performance UV and heat crosslinked or chain extended polymers'20016,312,121'Ink jet printing process'20016,273,985'Bonding process'20016,270,214'Ink jet printing process with improved image fixation'20016,260,949'Photoresist compositions for ink jet printheads'20016,187,512'Process for halomethylation of high performance polymers'20016,151,042'High performance polymer compositions'20006,142,618'System for depositing image enhancing fluid and ink jet printing process employing said system'20006,139,920'Photoresist compositions'20006,124,372'High performance polymer compositions having photosensitivity-imparting substituents and thermal sensitivity-imparting substituents'20006,087,414'Process for direct substitution of high performance polymers with unsaturated ester groups'20006,022,095'Curable compositions'20006,020,119'Process for halomethylation of high performance polymers'20005,994,425'Curable compositions containing photosensitive high performance aromatic ether polymers'19995,889,077'Process for direct substitution of high performance polymers with unsaturated ester groups'19995,761,809'Process for substituting haloalkylated polymers with unsaturated ester, ether, and alkylcarboxymethylene groups'19985,753,783'Process for haloalkylation of high performance polymers'19985,739,254'Process for haloalkylation of high performance polymers'19985,434,030'Toner compositions containing complexes of ionic dyes and ionophoric or ionomeric polymers'19955,424,160'Conductive carrier coatings and processes for the perfection thereof'19955,314,778'Toner compositions containing complexed ionomeric materials'19945,102,763'Toner compositions containing colored silica particles'19924,638,335'Optical recording member'19874,592,989'Toner compositions containing complex ionophoric polymeric materials'19864,095,020'Process for controlled phase transformation of alpha phase of poly(vinylidene fluoride) to the gamma phase'1978Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1978–2005Patents assigned to XEROX CORP (30)· patent assignee history
1978Based in Marion, NY, US· patent location history
1986–2005Based in Rochester, NY, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| XEROX CORP | 30 | 1978–2005 |
Locations
| Location | Patents | Span |
|---|---|---|
| Rochester, New York, US | 29 | 1986–2005 |
| Marion, New York, US | 1 | 1978 |