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Inventor

Hata Mitsuhiro

Inventor
Suwon-si, KR

Overview

2→
Patents
2010–2012
Patent span
Performing operations
Primary field (CPC B)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B82Yprimary
B82YSpecific uses or applications of nanostructures33%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
PatentTitleYear
8,241,837'Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device'20127,851,125'Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2012Patents assigned to SAMSUNG ELECTRONICS CO LTD (2)· patent assignee history
2010–2012Based in Suwon-si, KR· patent location history
2012Patents assigned to HAH JUNG-HWAN (1)· patent assignee history
2012Patents assigned to HONG JIN (1)· patent assignee history
2012Patents assigned to KIM HYUN-WOO (1)· patent assignee history
2012Patents assigned to MITSUHIRO HATA (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SAMSUNG ELECTRONICS CO LTD22010–2012
HAH JUNG-HWAN12012
HONG JIN12012
KIM HYUN-WOO12012
MITSUHIRO HATAself12012
Locations
LocationPatentsSpan
Suwon-si, KR22010–2012