Inventor
Levinus Pieter Bakker
Inventor
Helmond, NL
Overview
Patents· 77 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices41%
B82YSpecific uses or applications of nanostructures15%
G02BOptical elements, systems or apparatus9%
G21KHandling of particles or ionising radiation not otherwise provided for9%
G01NInvestigating or analysing materials by determining their chemical or physical properties6%
A61BDiagnosis4%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
Y10TTechnical subjects covered by former us classification3%
H05GX-ray technique3%
B08BCleaning in general1%
PatentTitleYear
9,980,698Re-calibration of pre-recorded images during interventions using a needle device20189,488,574'Device for imaging the interior of an optically turbid medium and receptacle unit for such a device'20169,398,877'Method and device for optical imaging of a turbid medium'20169,097,993'Optical element and lithographic apparatus'20158,835,875'Detection apparatus and detection method'20148,445,873'System and method for detecting at least one contamination species in a lithographic apparatus'20138,355,131'Device and method for acquiring image data from a turbid medium'20138,318,288'Optical element, lithographic apparatus including such optical element and device manufacturing method, and device manufactured thereby'20128,269,179'Illumination system and filter system'20128,217,347'System and method for detecting at least one contamination species in a lithographic apparatus'20128,173,975'Method and device for removing particles generated by means of a radiation source during generation of short-wave radiation'20128,137,869'Optical element, lithographic apparatus, method for manufacturing and/or protecting an optical element, device manufacturing method and device manufactured thereby'20128,139,200'Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method'20128,129,702'Radiation system with contamination barrier'20128,119,995'Device for detection of excitation using a multiple spot arrangement'20128,102,511'Lithographic apparatus with enhanced spectral purity, device manufacturing method and device manufactured thereby'20127,897,110'System and method for detecting at least one contamination species in a lithographic apparatus'20117,868,304'Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby'20117,852,460'Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method'20107,800,079'Assembly for detection of radiation flux and contamination of an optical component, lithographic apparatus including such an assembly and device manufacturing method'20107,776,390'Filter window manufacturing method'20107,750,331'Method and device for imaging an interior of a turbid medium using an amplification factor selected from an estimate of expected electrical signal strength'20107,737,425'Contamination barrier with expandable lamellas'20107,714,306'Lithographic apparatus and device manufacturing method'20107,715,100'Method and apparatus for generating radically and/or azimuthally polarized light beams'20107,706,057'Spectral purity filter for a multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method'20107,701,554'Lithographic apparatus, device manufacturing method, and optical component'20107,692,169'Method for filtering particles out of a beam of radiation and filter for a lithographic apparatus'20107,671,973'Optical analysis system using multivariate optical elements'20107,646,869'System for copy protection of an information carrier'20107,639,422'Device for generating an array of light spots'20097,630,060'Device manufacturing method, lithographic apparatus and device manufactured thereby'20097,592,610'Mirror for use in a lithographic apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby'20097,508,487'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20097,485,881'Lithographic apparatus, illumination system, filter system and method for cooling a support of such a filter system'20097,468,521'Lithographic apparatus and device manufacturing method'20087,463,413'Spectral purity filter for a multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method'20087,414,251'Method for providing an operable filter system for filtering particles out of a beam of radiation, filter system, apparatus and lithographic apparatus comprising the filter system'20087,405,825'Optical analysis system'20087,405,804'Lithographic apparatus with enhanced spectral purity, device manufacturing method and device manufactured thereby'20087,382,436'Mirror, lithographic apparatus, device manufacturing method, and device manufactured thereby'20087,352,434'Lithographic apparatus and device manufacturing method'20087,336,416'Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method'20087,315,346'Lithographic apparatus and device manufacturing method'20087,309,869'Lithographic apparatus, device manufacturing method and radiation system'20077,307,263'Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap'20077,279,690'Lithographic apparatus and device manufacturing method'20077,256,407'Lithographic projection apparatus and reflector assembly for use therein'20077,251,012'Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debris'20077,247,866'Contamination barrier with expandable lamellas'20077,235,801'Grazing incidence mirror, lithographic apparatus including a grazing incidence mirror, method for providing a grazing incidence mirror, method for enhancing EUV reflection of a grazing incidence mirror, device manufacturing method and device manufactured thereby'20077,233,009'Lithographic projection apparatus and reflector assembly for use therein'20077,211,810'Method for the protection of an optical element, lithographic apparatus, and device manufacturing method'20077,196,343'Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby'20077,193,229'Lithographic apparatus, illumination system and method for mitigating debris particles'20077,170,586'Lithographic apparatus and device manufacturing method'20077,161,653'Lithographic apparatus having a contaminant trapping system, a contamination trapping system, a device manufacturing method, and a method for improving trapping of contaminants in a lithographic apparatus'20077,145,132'Lithographic apparatus, illumination system and debris trapping system'20067,136,141'Lithographic apparatus with debris suppression, and device manufacturing method'20067,116,394'Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system'20067,106,832'Apparatus including a radiation source, a filter system for filtering particles out of radiation emitted by the source, and a processing system for processing the radiation, a lithographic apparatus including such an apparatus, and a method of filtering particles out of radiation emitting and propagating from a radiation source'20067,105,837'Lithographic apparatus, device manufacturing method and radiation system'20067,088,424'Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method'20067,061,574'Lithographic apparatus with contamination suppression, device manufacturing method, and device manufactured thereby'20067,057,190'Lithographic projection apparatus, particle barrier for use therein, integrated structure manufacturing method, and device manufactured thereby'20067,034,923'Optical element, lithographic apparatus comprising such optical element and device manufacturing method'20067,034,308'Radiation system, contamination barrier, lithographic apparatus, device manufacturing method and device manufactured thereby'20067,030,963'Lithographic apparatus and device manufacturing method'20066,987,275'Lithographic apparatus and device manufacturing method'20066,947,118'Lithographic apparatus and method of manufacturing a device'20056,930,760'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20056,906,788'Lithographic projection apparatus with multiple suppression meshes'20056,859,259'Lithographic projection apparatus and reflector assembly for use therein'20056,838,684'Lithographic projection apparatus and particle barrier for use therein'20056,791,665'Lithographic projection apparatus and device manufacturing method'20046,678,037'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20046,635,991'Method of adjusting the light spectrum of a gas discharge lamp, gas discharge lamp, and luminaire for said lamp'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003Based in Utrecht, NL· patent location history
2004–2015Patents assigned to ASML NETHERLANDS BV (62)· patent assignee history
2004–2015Based in Helmond, NL· patent location history
2004–2016Based in Eindhoven, NL· patent location history
2009–2013Patents assigned to KONINKL PHILIPS ELECTRONICS NV (8)· patent assignee history
2012–2018Patents assigned to BAKKER LEVINUS PIETER (16)· patent assignee history
2012–2013Patents assigned to BANINE VADIM YEVGENYEVICH (3)· patent assignee history
2014–2018Based in Shanghai, CN· patent location history
2016–2018Patents assigned to KONINKLIJKE PHILIPS NV (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 62 | 2004–2015 |
| BAKKER LEVINUS PIETERself | 16 | 2012–2018 |
| KONINKL PHILIPS ELECTRONICS NV | 8 | 2009–2013 |
| BANINE VADIM YEVGENYEVICH | 3 | 2012–2013 |
| KONINKLIJKE PHILIPS NV | 3 | 2016–2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Helmond, NL | 64 | 2004–2015 |
| Eindhoven, NL | 9 | 2004–2016 |
| Shanghai, CN | 3 | 2014–2018 |
| Utrecht, NL | 1 | 2003 |