Inventor

Harald Lauke

Inventor
Mannheim, DE

Overview

22→
Patents
1988–2001
Patent span
Chemistry
Primary field (CPC C)

Patents· 22 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Fprimary
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds40%
B41NPrinting plates or foils13%
C07CAcyclic or carbocyclic compounds10%
G03GElectrography10%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients3%
C08LCompositions of macromolecular compounds3%
C25DProcesses for the electrolytic or electrophoretic production of coatings3%
Y10TTechnical subjects covered by former us classification3%
PatentTitleYear
6,184,282'Flameproof polyamide moulding compounds containing melamine cyanurate'20015,476,907'Poly(meth) acrylimides of improved color'19955,442,109'Preparation of oxadimethacrylic acid'19955,395,898'N-aryl-substituted poly(meth)acrylimides'19955,393,917'Isolation and purification of oxadimethacrylics'19955,378,765'N-aryl-substituted poly (meth) acrylimides'19955,374,688'Poly(meth)acrylamides'19945,354,895'Oxadimethacrylics and preparation thereof'19945,354,814'Polymethacrylimides having a high heat resistance'19945,350,808'Poly(meth)acrylimides with different n-substitutes'19945,338,805'Polymethacrylimides having high heat distortion resistance'19945,262,278'Storage-stable solution of a carboxyl-containing copolymer and production of photosensitive coatings and offset printing plates'19935,247,035'Soluble polymers'19935,176,962'Methacrylate (co)polymers containing carbazolyl side groups and electropohotographic recording elements containing the said (co)polymers'19935,116,911'Methacrylate (co)polymers containing carbazolyl side groups and electrophotographic recording elements containing the said (co)polymers'19925,100,971'Preparation of carbazole-substituted polyacrylates or polymethacrylates, the products thus prepared and their use'19925,073,475'Production of plate-like, sheet-like or tape-like materials and of sensitized lithographic printing plates'19914,970,138'Damping solution for offset printing'19904,939,068'Anodic oxidation of the surface of aluminum or aluminum alloys'19904,935,332'Photosensitive element having an aluminum base and silane intermediate layer'19904,935,330'Photopolymerizable mixture, photosensitive recording element containing this mixture, and the production of lithographic printing plate using this photosensitive recording element'19904,782,000'Electrophotographic recording elements with hydrolyzed silane layer'1988

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1988–2001Patents assigned to BASF AG (22)· patent assignee history
1988–2001Based in Mannheim, DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
BASF AG221988–2001
Locations
LocationPatentsSpan
Mannheim, DE221988–2001