Inventor

Bradley O. Stimson

Inventor
San Jose, CA, US

Overview

36→
Patents
1997–2018
Patent span
Electricity
Primary field (CPC H)

Patents· 36 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps30%
C23CCoating metallic material17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution7%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy6%
B82YSpecific uses or applications of nanostructures4%
H03HImpedance networks, e.g. resonant circuits4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
Y02PClimate change mitigation technologies in the production or processing of goods4%
Y10TTechnical subjects covered by former us classification4%
PatentTitleYear
10,158,115Flash evaporation of solid state battery component20189,786,905'Iron, fluorine, sulfur compounds for battery cell cathodes'20179,692,039'Nanostructured materials for electrochemical conversion reactions'20179,640,793'Nanostructured materials for electrochemical conversion reactions'20179,246,158'Nanostructured materials for electrochemical conversion reactions'20169,222,165'Cooled PVD shield'20158,961,756'Ganged scanning of multiple magnetrons, especially two level folded magnetrons'20158,444,766'System and method for recycling a gas used to deposit a semiconductor layer'20138,298,625'Multiple phase RF power for electrode of plasma chamber'20127,939,747'Solar heating method and apparatus'20117,815,782'PVD target'20107,163,607'Process kit for improved power coupling through a workpiece in a semiconductor wafer processing system'20076,824,658'Partial turn coil for generating a plasma'20046,723,214'Apparatus for improved power coupling through a workpiece in a semiconductor wafer processing system'20046,719,883'Use of variable RF generator to control coil voltage distribution'20046,673,724'Pulsed-mode RF bias for side-wall coverage improvement'20046,625,003'Method and apparatus for balancing an electrostatic force produced by an electrostatic chuck'20036,554,979'Method and apparatus for bias deposition in a modulating electric field'20036,461,483'Method and apparatus for performing high pressure physical vapor deposition'20026,345,588'Use of variable RF generator to control coil voltage distribution'20026,344,419'Pulsed-mode RF bias for sidewall coverage improvement'20026,297,595'Method and apparatus for generating a plasma'20016,264,812'Method and apparatus for generating a plasma'20016,254,746'Recessed coil for generating a plasma'20016,254,738'Use of variable impedance having rotating core to control coil sputter distribution'20016,235,169'Modulated power for ionized metal plasma deposition'20016,228,229'Method and apparatus for generating a plasma'20016,221,221'Apparatus for providing RF return current path control in a semiconductor wafer processing system'20016,219,219'Cathode assembly containing an electrostatic chuck for retaining a wafer in a semiconductor wafer processing system'20016,190,513'Darkspace shield for improved RF transmission in inductively coupled plasma sources for sputter deposition'20016,077,353'Pedestal insulator for a pre-clean chamber'20005,972,178'Continuous process for forming improved titanium nitride barrier layers'19995,879,176'Interlocked connector'19995,712,592'RF plasma power supply combining technique for increased stability'19985,685,941'Inductively coupled plasma reactor with top electrode for enhancing plasma ignition'19975,629,653'RF match detector circuit with dual directional coupler'1997

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1997–2015Patents assigned to APPLIED MATERIALS INC (29)· patent assignee history
1997–2001Based in Mountain View, CA, US· patent location history
1999–2018Based in San Jose, CA, US· patent location history
2010–2017Based in Monte Sereno, CA, US· patent location history
2012–2015Patents assigned to STIMSON BRADLEY O (3)· patent assignee history
2015Patents assigned to HOSOKAWA AKIHIRO (2)· patent assignee history
2015Patents assigned to INAGAWA MAKOTO (2)· patent assignee history
2016–2018Patents assigned to QUANTUMSCAPE CORP (5)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC291997–2015
QUANTUMSCAPE CORP52016–2018
STIMSON BRADLEY Oself32012–2015
HOSOKAWA AKIHIRO22015
INAGAWA MAKOTO22015
Locations
LocationPatentsSpan
San Jose, California, US211999–2018
Monte Sereno, California, US102010–2017
Mountain View, California, US51997–2001