Inventor
Tatsuo Enami
Inventor
Yokohama, JP
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Sprimary
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light50%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light30%
Y10TTechnical subjects covered by former us classification20%
PatentTitleYear
8,813,329'Chamber replacing method'20147,984,539'Chamber replacing method'20117,196,796'Wavelength detecting apparatus, laser apparatus, and wavelength detecting method'20076,819,699'Arf excimer laser device, scanning type exposure device and ultraviolet laser device'20046,636,297'Vacuum ultraviolet laser wavelength measuring apparatus'20036,337,872'Once through fan for excimer laser apparatus'20026,243,163'Wavelength detector'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2014Patents assigned to KOMATSU MFG CO LTD (5)· patent assignee history
2001Based in Hiratsuka, JP· patent location history
2002Patents assigned to EBARA CORP (1)· patent assignee history
2002–2014Based in Yokohama, JP· patent location history
2003–2014Patents assigned to GIGAPHOTON INC (4)· patent assignee history
2011–2014Patents assigned to USHIO ELECTRIC INC (2)· patent assignee history
2014Patents assigned to ENAMI TATSUO (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KOMATSU MFG CO LTD | 5 | 2001–2014 |
| GIGAPHOTON INC | 4 | 2003–2014 |
| USHIO ELECTRIC INC | 2 | 2011–2014 |
| EBARA CORP | 1 | 2002 |
| ENAMI TATSUOself | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokohama, JP | 6 | 2002–2014 |
| Hiratsuka, JP | 1 | 2001 |