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Inventor

Chiaki Yamagishi

Inventor
Hitachi, JP

Overview

5→
Patents
1991–2013
Patent span
Chemistry
Primary field (CPC C)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C09Gprimary
C09GPolishing compositions31%
C09KMaterials for miscellaneous applications, not provided for elsewhere31%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1031%
G03GElectrography8%
PatentTitleYear
8,524,111'CMP abrasive slurry for polishing insulation film, polishing method, and semiconductor electronic part polished by the polishing method'20138,168,541'CMP polishing slurry and polishing method'20127,838,482'CMP polishing compound and polishing method'20107,837,800'CMP polishing slurry and polishing method'20105,073,466'Electrophotographic member containing a fluorine-containing lubricating agent and process for producing the same'1991

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1991–2013Patents assigned to HITACHI CHEMICAL CO LTD (5)· patent assignee history
1991–2013Based in Hitachi, JP· patent location history
2012–2013Patents assigned to ENOMOTO KAZUHIRO (2)· patent assignee history
2012–2013Patents assigned to FUKASAWA MASATO (2)· patent assignee history
2012–2013Patents assigned to KOYAMA NAOYUKI (2)· patent assignee history
2012–2013Patents assigned to YAMAGISHI CHIAKI (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI CHEMICAL CO LTD51991–2013
ENOMOTO KAZUHIRO22012–2013
FUKASAWA MASATO22012–2013
KOYAMA NAOYUKI22012–2013
YAMAGISHI CHIAKIself22012–2013
Locations
LocationPatentsSpan
Hitachi, JP51991–2013