Inventor

Baik-soon Choi

Inventor
Kyungki-do, KR

Overview

21→
Patents
2000–2017
Patent span
Electricity
Primary field (CPC H)

Patents· 21 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests13%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices10%
H01JElectric discharge tubes or discharge lamps10%
B08BCleaning in general8%
B24BMachines, devices, or processes for grinding or polishing8%
B24DTools for grinding, buffing or sharpening8%
C23CCoating metallic material6%
C11DDetergent compositions4%
G01NInvestigating or analysing materials by determining their chemical or physical properties4%
PatentTitleYear
9,840,785'Tin plating solution, tin plating equipment, and method for fabricating semiconductor device using the tin plating solution'20178,227,182'Methods of forming a photosensitive film'20127,863,231'Thinner composition and method of removing photoresist using the same'20117,387,988'Thinner composition and method of removing photoresist using the same'20086,740,169'Method of reworking a conditioning disk'20046,682,876'Thinner composition and method of stripping a photoresist using the same'20046,664,119'Chemical vapor deposition method for manufacturing semiconductor devices'20036,596,087'Method of cleaning conditioning disk'20036,589,719'Photoresist stripper compositions'20036,585,907'Method for manufacturing a shield for an inductively-couple plasma apparatus'20036,499,492'Plasma process apparatus with in situ monitoring, monitoring method, and in situ residue cleaning'20026,494,927'Conditioner and conditioning disk for a CMP pad, and method of fabricating, reworking, and cleaning conditioning disk'20026,432,838'Chemical vapor deposition apparatus for manufacturing semiconductor devices, its driving method, and method of optimizing recipe of cleaning process for process chamber'20026,335,284'Metallization process for manufacturing semiconductor devices'20026,279,503'Chemical vapor deposition apparatus for manufacturing semiconductor devices'20016,251,241'Inductive-coupled plasma apparatus employing shield and method for manufacturing the shield'20016,216,548'Method for sampling particles present in a processing chamber'20016,213,856'Conditioner and conditioning disk for a CMP pad, and method of fabricating, reworking, and cleaning conditioning disk'20016,179,955'Dry etching apparatus for manufacturing semiconductor devices'20016,146,492'Plasma process apparatus with in situ monitoring, monitoring method, and in situ residue cleaning method'20006,119,532'Apparatus and method for particle sampling during semiconductor device manufacturing'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2017Patents assigned to SAMSUNG ELECTRONICS CO LTD (21)· patent assignee history
2000–2003Based in Seoul, KR· patent location history
2001–2004Based in Kyungki-do, KR· patent location history
2002Based in Anyang, KR· patent location history
2003–2017Based in Anyang-si, KR· patent location history
2012Patents assigned to AHN SEUNG-HYUN (1)· patent assignee history
2012Patents assigned to CHOI BAIK-SOON (1)· patent assignee history
2012Patents assigned to DONGWOO FINE CHEM CO LTD (1)· patent assignee history
2012Patents assigned to KIM SANG-TAE (1)· patent assignee history
2012Based in Gyeonggi-do, KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SAMSUNG ELECTRONICS CO LTD212000–2017
AHN SEUNG-HYUN12012
CHOI BAIK-SOONself12012
DONGWOO FINE CHEM CO LTD12012
KIM SANG-TAE12012
Locations
LocationPatentsSpan
Kyungki-do, KR72001–2004
Seoul, KR72000–2003
Anyang-si, KR52003–2017
Gyeonggi-do, KR12012
Anyang, KR12002