Inventor
RYO KARASAWA
Inventor
JP
Overview
Patents· 11 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices19%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices12%
C08LCompositions of macromolecular compounds10%
C09DCoating compositions, e.g. paints, varnishes or lacquers10%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds7%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%
C09JAdhesives5%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form3%
C11DDetergent compositions3%
PatentTitleYear
12,441,964Cleaning agent composition and cleaning method202512,242,194Resist underlayer film-forming composition comprising epoxy adduct having long-chain alkyl group202512,025,916Resist underlayer film-forming composition that contains triaryldiamine-containing novolac resin to which aromatic vinyl compound is added202411,926,765Adhesive composition for peeling off by irradiation with light, layered product, and production method and peeling method for layered product202411,866,676Cleaning agent composition and cleaning method202411,592,747Resist underlayer film-forming composition comprising carbonyl-containing polyhydroxy aromatic ring novolac resin202311,479,627Film forming composition containing fluorine-containing surfactant202211,472,168Laminated body including novolac resin as peeling layer202211,459,414Film forming composition containing fluorine-containing surfactant202211,199,775Resist underlayer film-forming composition containing naphthol aralkyl resin202111,194,251Resist underlayer film-forming composition for lithography containing polymer having blocked isocyanate structure2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to NISSAN CHEMICAL CORP (6)· patent assignee history
2021–2025Patents assigned to NISSAN CHEMICAL IND LTD (5)· patent assignee history
2021–2025Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NISSAN CHEMICAL CORP | 6 | 2021–2025 |
| NISSAN CHEMICAL IND LTD | 5 | 2021–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 11 | 2021–2025 |