Inventor

Hideki Hayashida

Inventor

Tokyo, JP

Overview

2000–2006

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary

C23CCoating metallic material18%

C01CAmmonia14%

C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds9%

C30BSingle-crystal growth9%

G11BInformation storage based on relative movement between record carrier and transducer9%

Y02PClimate change mitigation technologies in the production or processing of goods9%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%

Y10TTechnical subjects covered by former us classification9%

B41MPrinting, duplicating, marking, or copying processes5%

G01NInvestigating or analysing materials by determining their chemical or physical properties5%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2000–2006Patents assigned to SHOWA DENKO KK (4)· patent assignee history

2000–2006Based in Tokyo, JP· patent location history

2001Patents assigned to ANELVA CORP (2)· patent assignee history

2001Based in Tachikawa, JP· patent location history

2006Based in Kanagawa, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
SHOWA DENKO KK	4	2000–2006
ANELVA CORP	2	2001

Locations