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Inventor

Pei-Yi Liu

Inventor
Changhua County, TW

Overview

26→
Patents
2013–2020
Patent span
Physics
Primary field (CPC G)

Patents· 26 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices24%
G06FElectric digital data processing15%
H01JElectric discharge tubes or discharge lamps9%
H01LSemiconductor devices8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
H10DInorganic electric semiconductor devices5%
B29DProducing particular articles from plastics or from substances in a plastic state3%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts3%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds3%
C08LCompositions of macromolecular compounds3%
PatentTitleYear
10,811,225Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity202010,795,057Composition for manufacturing contact lenses202010,431,423Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity201910,359,695Method of fabricating an integrated circuit with non-printable dummy features201910,356,802Base station and scheduling method of uplink resource unit201910,170,276Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity20199,958,578Composition for manufacturing contact lenses and method for manufacturing contact lenses by using the same20189,703,009'Material for contact lenses, contact lenses and method of forming the same'20179,678,434'Grid refinement method'20179,658,538'System and technique for rasterizing circuit layout data'20179,594,862'Method of fabricating an integrated circuit with non-printable dummy features'20179,552,964'Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity'20179,529,271'Grid refinement method'20169,436,787'Method of fabricating an integrated circuit with optimized pattern density uniformity'20169,436,788'Method of fabricating an integrated circuit with block dummy for optimized pattern density uniformity'20169,329,488'Grid refinement method'20169,176,389'Grid refinement method'20159,134,627'Multiple-patterning overlay decoupling method'20158,984,452'Long-range lithographic dose correction'20158,972,908'Method for electron beam proximity correction with improved critical dimension accuracy'20158,828,632'Multiple-grid exposure method'20148,822,106'Grid refinement method'20148,822,107'Grid refinement method'20148,584,057'Non-directional dithering methods'20138,530,121'Multiple-grid exposure method'20138,510,687'Error diffusion and grid shift in lithography'2013

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2016Patents assigned to TAIWAN SEMICONDUCTOR MFG (10)· patent assignee history
2013–2015Patents assigned to LIN BURN JENG (4)· patent assignee history
2013–2015Patents assigned to LIN SHY-JAY (4)· patent assignee history
2013–2015Patents assigned to Liu pei-yi (4)· patent assignee history
2013–2020Based in Changhua County, TW· patent location history
2016–2020Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (11)· patent assignee history
2017–2020Based in Taoyuan, TW· patent location history
2019Based in Taichung, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG CO LTD112016–2020
TAIWAN SEMICONDUCTOR MFG102013–2016
LIN BURN JENG42013–2015
LIN SHY-JAY42013–2015
Liu pei-yiself42013–2015
Locations
LocationPatentsSpan
Changhua County, TW222013–2020
Taoyuan, TW32017–2020
Taichung, TW12019