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Inventor

Koji Itadani

Inventor
Osaka, JP

Overview

8→
Patents
1998–2018
Patent span
Electricity
Primary field (CPC H)

Patents· 8 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps36%
H03HImpedance networks, e.g. resonant circuits29%
H01PWaveguides14%
H05HPlasma technique14%
C23CCoating metallic material7%
PatentTitleYear
10,109,461Plasma processing method20189,734,992'Plasma processing apparatus'20179,663,858'Plasma processing apparatus'20179,270,250'High frequency matching system'20169,059,680'Impedance adjusting apparatus'20156,946,847'Impedance matching device provided with reactance-impedance table'20056,621,372'Impedance matching device'20035,843,236'Plasma processing apparatus for radiating microwave from rectangular waveguide through long slot to plasma chamber'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2018Patents assigned to DAIHEN CORP (8)· patent assignee history
1998Based in Amagasaki, JP· patent location history
2003–2005Based in Sanda, JP· patent location history
2015–2018Based in Osaka, JP· patent location history
2017–2018Patents assigned to TOKYO ELECTRON LTD (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
DAIHEN CORP81998–2018
TOKYO ELECTRON LTD32017–2018
Locations
LocationPatentsSpan
Osaka, JP52015–2018
Sanda, JP22003–2005
Amagasaki, JP11998