Inventor

Liwan Yue

Inventor
Shanghai, CN

Overview

9→
Patents
2016–2020
Patent span
Physics
Primary field (CPC G)

Patents· 9 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices26%
H05GX-ray technique22%
G02BOptical elements, systems or apparatus11%
G01BMeasuring length, thickness or similar linear dimensions7%
B25JManipulators4%
G06TImage data processing or generation, in general4%
G21KHandling of particles or ionising radiation not otherwise provided for4%
H01LSemiconductor devices4%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light4%
H04NPictorial communication, e.g. television4%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2016Patents assigned to SEMICONDUCTOR MFG INT SHANGHAI (1)· patent assignee history
2016–2020Based in Shanghai, CN· patent location history
2017–2020Patents assigned to SEMICONDUCTOR MFG INT SHANGHAI CORP (7)· patent assignee history
2017Patents assigned to SEMICONDUCTOR MFG INTERNATIONAL (SHANGHAI) CORPORATION (1)· patent assignee history
2020Patents assigned to SEMICONDUCTOR MFG INT BEIJING CORP (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SEMICONDUCTOR MFG INT SHANGHAI CORP72017–2020
SEMICONDUCTOR MFG INT BEIJING CORP12020
SEMICONDUCTOR MFG INT SHANGHAI12016
SEMICONDUCTOR MFG INTERNATIONAL (SHANGHAI) CORPORATION12017
Locations
LocationPatentsSpan
Shanghai, CN92016–2020