Inventor

Shigeru Noguchi

Inventor
Hirakata, JP

Overview

36→
Patents
1989–2011
Patent span
Electricity
Primary field (CPC H)

Patents· 36 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Fprimary
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation16%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution15%
Y02PClimate change mitigation technologies in the production or processing of goods14%
C07DHeterocyclic compounds9%
A23LFoods, foodstuffs or non-alcoholic beverages, not otherwise provided for6%
H10DInorganic electric semiconductor devices6%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations5%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%
H01JElectric discharge tubes or discharge lamps4%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
PatentTitleYear
7,893,279'Cyclohexanecarboxylic acid compound'20117,691,894'Cyclohexanecarboxylic acid compound'20106,991,821'Method for producing packed tofu'20066,879,393'Defect inspection apparatus for phase shift mask'20056,552,197'Condensed-hexacyclic compounds and a process therefor'20036,531,176'Method and apparatus for producing tofu'20036,504,029'Condensed-hexacyclic compounds and a process therefor'20036,337,400'Process for the preparation of tetrahydroindolizines'20026,284,304'Process for producing tofu'20016,272,980'Apparatus for producing tofu'20016,172,230'Process for the preparation of tetrahydro-indolizines'20016,120,830'Process for producing tofu'20005,849,945'Aminotetralone derivatives and preparation process thereof'19985,705,828'Photovoltaic device'19985,543,256'Method for exposing a pattern plate having an alignment pattern and a pattern plate exposed by said method'19965,455,430'Photovoltaic device having a semiconductor grade silicon layer formed on a metallurgical grade substrate'19955,419,783'Photovoltaic device and manufacturing method therefor'19955,401,336'Photovoltaic device'19955,378,289'Method of forming crystalline silicon film and solar cell obtained thereby'19955,370,747'Photovoltaic device'19945,318,919'Manufacturing method of thin film transistor'19945,262,695'Micromachine'19935,243,216'Phototransistor'19935,236,516'Photovoltaic apparatus'19935,231,297'Thin film transistor'19935,221,365'Photovoltaic cell and method of manufacturing polycrystalline semiconductive film'19935,213,628'Photovoltaic device'19935,211,761'Photovoltaic device and manufacturing method thereof'19935,183,780'Method of fabricating semiconductor device'19935,164,596'Focused ion beam irradiating apparatus'19925,155,051'Method of manufacturing photovoltaic device'19925,144,391'Semiconductor device which relieves internal stress and prevents cracking'19925,097,338'Scanning type image sensor'19925,061,851'Inspection method and device for an aperture in a focused ion beam generating apparatus'19914,922,111'Card type image reader with means for relieving bending stress'19904,831,429'Transparent photo detector device'1989

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1989–1998Patents assigned to SANYO ELECTRIC CO (20)· patent assignee history
1989–1995Based in Osaka, JP· patent location history
1991–2005Patents assigned to DAINIPPON PRINTING CO LTD (4)· patent assignee history
1991–2011Based in Tokyo, JP· patent location history
1992–1998Based in Hirakata, JP· patent location history
1998–2011Patents assigned to DAIICHI SEIYAKU CO (7)· patent assignee history
1998Patents assigned to KABUSHIKIKAISHA YAKULT HONSHA (1)· patent assignee history
2000–2006Patents assigned to KIKKOMAN CORP (5)· patent assignee history
2000–2001Based in Kariya, Aichi-pref., JP· patent location history
2001–2003Based in Noda, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SANYO ELECTRIC CO201989–1998
DAIICHI SEIYAKU CO71998–2011
KIKKOMAN CORP52000–2006
DAINIPPON PRINTING CO LTD41991–2005
KABUSHIKIKAISHA YAKULT HONSHA11998
Locations
LocationPatentsSpan
Hirakata, JP131992–1998
Tokyo, JP111991–2011
Osaka, JP71989–1995
Noda, JP22001–2003
Kariya, Aichi-pref., JP22000–2001