Inventor
Olivier Luere
Inventor
Sunnyvale, CA, US
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
H01JElectric discharge tubes or discharge lamps28%
H01LSemiconductor devices16%
H05HPlasma technique11%
C23CCoating metallic material9%
H10DInorganic electric semiconductor devices2%
LOC132%
PatentTitleYear
11,069,504Creating ion energy distribution functions (IEDF)202111,049,760Universal process kit202110,991,556Adjustable extended electrode for edge uniformity control202110,923,321Apparatus and method of generating a pulsed waveform202110,916,408Apparatus and method of forming plasma using a pulsed waveform202110,791,617Method of controlling ion energy distribution using a pulse generator with a current-return output stage202010,685,807Creating ion energy distribution functions (IEDF)202010,553,404Adjustable extended electrode for edge uniformity control202010,555,412Method of controlling ion energy distribution using a pulse generator with a current-return output stage202010,504,702Adjustable extended electrode for edge uniformity control201910,448,494Method of controlling ion energy distribution using a pulse generator with a current-return output stage201910,448,495Method of controlling ion energy distribution using a pulse generator with a current-return output stage201910,312,048Creating ion energy distribution functions (IEDF)201910,109,464Minimization of ring erosion during plasma processes201810,103,010Adjustable extended electrode for edge uniformity control20189,947,517Adjustable extended electrode for edge uniformity control2018D0797691'Composite edge ring'20179,520,302'Methods for controlling Fin recess loading'20169,281,190'Local and global reduction of critical dimension (CD) asymmetry in etch processing'20169,269,590'Spacer formation'2016Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2016–2021Patents assigned to APPLIED MATERIALS INC (20)· patent assignee history
2016Patents assigned to CHIANG KANG-LIE (1)· patent assignee history
2016Patents assigned to CHOI JINHAN (1)· patent assignee history
2016Patents assigned to LUERE OLIVIER (1)· patent assignee history
2016–2021Based in Sunnyvale, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 20 | 2016–2021 |
| CHIANG KANG-LIE | 1 | 2016 |
| CHOI JINHAN | 1 | 2016 |
| LUERE OLIVIERself | 1 | 2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Sunnyvale, California, US | 20 | 2016–2021 |