Inventor

Joseph J. Fatula, Jr.

Inventor
San Jose, CA, US

Overview

25→
Patents
1981–2015
Patent span
Electricity
Primary field (CPC H)

Patents· 25 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

Y10Sprimary
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
C25DProcesses for the electrolytic or electrophoretic production of coatings9%
G11BInformation storage based on relative movement between record carrier and transducer9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
Y10TTechnical subjects covered by former us classification9%
G06FElectric digital data processing8%
H01FMagnets6%
H10DInorganic electric semiconductor devices6%
B65GTransport or storage devices, e.g. conveyors for loading or tipping, shop conveyor systems or pneumatic tube conveyors4%
C25BElectrolytic or electrophoretic processes for the production of compounds or non-metals4%
PatentTitleYear
9,137,043'System, method and program for determining a network path by which to send a message'20158,332,483'Apparatus, system, and method for autonomic control of grid system resources'20128,229,587'Semiconductor fabrication facility visualization system with performance optimization'20128,196,732'Buffered storage and transport device for tool utilization'20128,096,408'Segmented material conveyor system, threshold assembly and method for making and using the same'20127,708,031'Check valve'20107,698,428'Apparatus, system, and method for grid based data storage'20107,680,933'Apparatus, system, and method for on-demand control of grid system resources'20107,584,226'System and method for peer-to-peer grid based autonomic and probabilistic on-demand backup and restore'20096,843,894'Cathode current control system for a wafer electroplating apparatus'20056,679,762'Recession control via thermal expansion coefficient differences in recording heads during lapping'20046,627,051'Cathode current control system for a wafer electroplating apparatus'20036,500,316'Apparatus for rotary cathode electroplating with wireless power transfer'20026,437,472'Apparatus for wireless transfer of power to a rotating element'20026,379,511'Paddle design for plating bath'20026,379,570'Method of making high definition chevron type MR sensor'20026,322,674'Cathode current control system for a wafer electroplating apparatus'20016,278,210'Rotary element apparatus with wireless power transfer'20016,118,623'High definition chevron type MR sensor'20006,001,235'Rotary plater with radially distributed plating solution'19995,920,762'Method of making low mass magnetic recording head and suspension'19995,742,452'Low mass magnetic recording head and suspension'19984,407,058'Method of making dense vertical FET\'s'19834,397,075'FET Memory cell structure and process'19834,285,761'Process for selectively forming refractory metal silicide layers on semiconductor devices'1981

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1981–2015Patents assigned to IBM (18)· patent assignee history
1981–1983Based in Beacon, NY, US· patent location history
1983Based in Poughkeepsie, NY, US· patent location history
1998–2015Based in San Jose, CA, US· patent location history
2001–2005Patents assigned to SEMITOOL INC (3)· patent assignee history
2012Patents assigned to FATULA JR JOSEPH JOHN (4)· patent assignee history
2012Patents assigned to MURATEC AUTOMATION CO LTD (3)· patent assignee history
2012Patents assigned to CARLSON ROBERT (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IBM181981–2015
FATULA JR JOSEPH JOHNself42012
MURATEC AUTOMATION CO LTD32012
SEMITOOL INC32001–2005
CARLSON ROBERT12012
Locations
LocationPatentsSpan
San Jose, California, US221998–2015
Beacon, New York, US21981–1983
Poughkeepsie, New York, US11983