LexDanaLexDanabeta
Inventor

Takayuki Sakakibara

Inventor
Nagoya, JP

Overview

17→
Patents
1998–2021
Patent span
General tagging of new technological developments
Primary field (CPC Y)

Patents· 17 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

Y10Tprimary
Y10TTechnical subjects covered by former us classification18%
C22CAlloys14%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%
B82YSpecific uses or applications of nanostructures9%
C21DModifying the physical structure of ferrous metals9%
H01JElectric discharge tubes or discharge lamps9%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%
F16FSprings7%
C09DCoating compositions, e.g. paints, varnishes or lacquers5%
B23BTurning2%
PatentTitleYear
11,027,401Socket20218,936,236'Coil spring for automobile suspension and method of manufacturing the same'20158,789,817'Spring steel and spring having superior corrosion fatigue strength'20148,349,095'Spring steel and spring having superior corrosion fatigue strength'20138,328,169'Spring steel and spring having superior corrosion fatigue strength'20128,192,840'Spring with high durability and method of coating the same'20127,908,081'Navigation apparatus, navigation system and route search method'20117,776,440'Spring coated with powder coating of epoxy resin and thermoplastic resin'20107,699,943'Method for manufacturing high-strength spring'20107,407,555'Oil tempered wire for cold forming coil springs'20086,224,686'High-strength valve spring and it\'s manufacturing method'20016,193,816'Spring with corrosion fatigue strength'20016,090,527'Electron beam exposure mask and method of manufacturing the same and electron beam exposure method'20006,087,048'Method of producing block mask for electron-beam lithography apparatuses'20005,952,155'Mask and method of creating mask as well as electron-beam exposure method and electron-beam exposure device'19995,849,437'Electron beam exposure mask and method of manufacturing the same and electron beam exposure method'19985,824,437'Mask and method of creating mask as well as electron-beam exposure method and electron-beam exposure device'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2000Patents assigned to FUJITSU LTD (4)· patent assignee history
1998–2000Based in Kasugai, JP· patent location history
2001–2015Patents assigned to CHUO HATSUJO KK (10)· patent assignee history
2001Based in Okazaki, JP· patent location history
2008–2015Based in Nagoya, JP· patent location history
2011Based in Kawasaki, JP· patent location history
2012–2015Patents assigned to SAKAKIBARA TAKAYUKI (5)· patent assignee history
2012–2015Patents assigned to WAKITA MASAMI (5)· patent assignee history
2012–2015Patents assigned to KUNO TAKANORI (4)· patent assignee history
2021Based in Wako, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CHUO HATSUJO KK102001–2015
SAKAKIBARA TAKAYUKIself52012–2015
WAKITA MASAMI52012–2015
FUJITSU LTD41998–2000
KUNO TAKANORI42012–2015
Locations
LocationPatentsSpan
Nagoya, JP82008–2015
Kasugai, JP41998–2000
Okazaki, JP22001
Wako, JP12021
Kawasaki, JP12011