Inventor

Hsiu-Mei Chen

Inventor
Taichung, TW

Overview

6→
Patents
2002–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices15%
B25BTools or bench devices not otherwise provided for, for fastening, connecting, disengaging, or holding8%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds8%
C11DDetergent compositions8%
C12NMicroorganisms or enzymes8%
G02BOptical elements, systems or apparatus8%
H01LSemiconductor devices8%
H04BTransmission8%
H04LTransmission of digital information, e.g. telegraphic communication8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002Patents assigned to IND TECH RES INST (1)· patent assignee history
2002Based in Hsinchu, TW· patent location history
2003Patents assigned to UNIV IOWA STATE (1)· patent assignee history
2003Based in Taipei, TW· patent location history
2015Patents assigned to CHEN HSIU-MEI (1)· patent assignee history
2015Based in Kaohsiung, TW· patent location history
2018Patents assigned to AIR PROD & CHEM (1)· patent assignee history
2018Based in Taoyuan, TW· patent location history
2021Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (2)· patent assignee history
2021Based in Taichung, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG CO LTD22021
AIR PROD & CHEM12018
CHEN HSIU-MEIself12015
IND TECH RES INST12002
UNIV IOWA STATE12003
Locations
LocationPatentsSpan
Taichung, TW22021
Taoyuan, TW12018
Kaohsiung, TW12015
Taipei, TW12003
Hsinchu, TW12002