Inventor
Koji Ebara
Inventor
Annaka, JP
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1026%
C30BSingle-crystal growth16%
H01LSemiconductor devices16%
H10DInorganic electric semiconductor devices11%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1011%
B41JTypewriters5%
G01RMeasuring electric variables5%
G07CTime or attendance registers5%
Y10TTechnical subjects covered by former us classification5%
PatentTitleYear
10,297,463Method for manufacturing silicon wafer20199,390,905'Method for manufacturing silicon substrate and silicon substrate'20169,252,025'Method for manufacturing silicon single crystal wafer and electronic device'20168,377,202'Method for manufacturing silicon wafer and silicon wafer manufactured by this method'20137,839,426'Time recorder'20106,914,442'Method for measuring resistivity of semiconductor wafer'20056,589,336'Production method for silicon epitaxial wafer and silicon epitaxial wafer'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2019Patents assigned to SHINETSU HANDOTAI KK (6)· patent assignee history
2003–2019Based in Annaka, JP· patent location history
2010Patents assigned to SEIKO PRECISION KK (1)· patent assignee history
2010Based in Chiba, JP· patent location history
2013–2016Patents assigned to EBARA KOJI (2)· patent assignee history
2016Patents assigned to OKA TETSUYA (1)· patent assignee history
2016Patents assigned to TAKAHASHI SHUJI (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU HANDOTAI KK | 6 | 2003–2019 |
| EBARA KOJIself | 2 | 2013–2016 |
| OKA TETSUYA | 1 | 2016 |
| SEIKO PRECISION KK | 1 | 2010 |
| TAKAHASHI SHUJI | 1 | 2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Annaka, JP | 6 | 2003–2019 |
| Chiba, JP | 1 | 2010 |