Inventor

Yoshio Segi

Inventor

Nara, JP

Overview

1996–2004

Patent span

Physics

Primary field (CPC G)

Patents· 13 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Gprimary

G03GElectrography39%

C23CCoating metallic material21%

B08BCleaning in general7%

C11DDetergent compositions7%

C23GCleaning or de-greasing of metallic material by chemical methods other than electrolysis7%

H01JElectric discharge tubes or discharge lamps7%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%

Y10TTechnical subjects covered by former us classification4%

PatentTitleYear

6,686,109'Electrophotographic process and apparatus'2004 6,557,569'Method of manufacturing an electrophotographic photosensitive member including multiple liquid cleaning steps and machining step'2003 6,435,130'Plasma CVD apparatus and plasma processing method'2002 6,406,554'Method and apparatus for producing electrophotographic photosensitive member'2002 6,391,394'Method for manufacturing electrophotographic photosensitive member and jig used therein'2002 6,335,281'Deposited film forming process'2002 6,318,382'Cleaning method and cleaning apparatus, and electrophotographic photosensitive member and cleaning method of electrophotographic photosensitive member'2001 6,158,382'Method for forming a deposited film by plasma chemical vapor deposition and apparatus for forming a deposited film by plasma chemical vapor deposition'2000 6,156,472'Method of manufacturing electrophotographic photosensitive member'2000 6,103,442'Method and apparatus for producing electrophotographic photosensitive member'2000 5,943,531'Electrophotographic apparatus, image forming method, and process for fabricating light receiving member for electrophotography'1999 5,853,936'Light receiving member, substrate for said light receiving member, and electrophotographic apparatus having said light receiving member'1998 5,480,754'Electrophotographic photosensitive member and method of manufacturing the same'1996

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1996–2004Patents assigned to CANON KK (13)· patent assignee history

1996–2002Based in Nara, JP· patent location history

2001Based in Numazu, JP· patent location history

2003–2004Based in Shizuoka, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
CANON KK	13	1996–2004

Locations

Location	Patents	Span
Nara, JP	10	1996–2002
Shizuoka, JP	2	2003–2004
Numazu, JP	1	2001