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Inventor

Yusuke Fukuoka

Inventor
Nara, JP

Overview

12→
Patents
2005–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 12 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps21%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
C23CCoating metallic material14%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation7%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution7%
Y02PClimate change mitigation technologies in the production or processing of goods7%
B65GTransport or storage devices, e.g. conveyors for loading or tipping, shop conveyor systems or pneumatic tube conveyors3%
G06FElectric digital data processing3%
G06KGraphical data reading3%
G06VImage or video recognition or understanding3%
PatentTitleYear
10,643,089Information processing system to obtain and manage images of a property20208,395,250'Plasma processing apparatus with an exhaust port above the substrate'20138,389,389'Semiconductor layer manufacturing method, semiconductor layer manufacturing apparatus, and semiconductor device manufactured using such method and apparatus'20138,149,095'Gateway device allowing home network appliances to be introduced and controlled over a network and a control method therefor'20128,137,046'Substrate transfer apparatus and substrate transfer method'20128,092,640'Plasma processing apparatus and semiconductor device manufactured by the same apparatus'20128,093,142'Plasma processing apparatus and plasma processing method'20127,918,939'Semiconductor manufacturing apparatus and semiconductor manufacturing method using the same'20117,722,738'Semiconductor device manufacturing unit and semiconductor device manufacturing method'20107,540,257'Plasma processing apparatus and semiconductor device manufactured by the same apparatus'20097,032,536'Thin film formation apparatus including engagement members for support during thermal expansion'20066,979,589'Silicon-based thin-film photoelectric conversion device and method of manufacturing thereof'2005

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005–2013Patents assigned to SHARP KK (10)· patent assignee history
2005–2010Based in Ikoma, JP· patent location history
2006–2012Based in Nara, JP· patent location history
2012–2013Patents assigned to FUKUOKA YUSUKE (6)· patent assignee history
2012–2013Patents assigned to KISHIMOTO KATSUSHI (5)· patent assignee history
2012Patents assigned to HAYASHI JUN (1)· patent assignee history
2012Patents assigned to HORIBUCHI TAKAAKI (1)· patent assignee history
2012–2013Based in Osaka, JP· patent location history
2020Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHARP KK102005–2013
FUKUOKA YUSUKEself62012–2013
KISHIMOTO KATSUSHI52012–2013
HAYASHI JUN12012
HORIBUCHI TAKAAKI12012
Locations
LocationPatentsSpan
Nara, JP52006–2012
Osaka, JP42012–2013
Ikoma, JP22005–2010
Tokyo, JP12020