Inventor
RALF RIESKE
Inventor
DE
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B23Kprimary
B23KSoldering or unsoldering22%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
H01LSemiconductor devices20%
B28DWorking stone or stone-like materials14%
H10DInorganic electric semiconductor devices8%
C30BSingle-crystal growth5%
H05KPrinted circuits3%
G05BControl or regulating systems in general2%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%
Y02PClimate change mitigation technologies in the production or processing of goods2%
PatentTitleYear
12,539,565Method for producing short subcritical cracks in solid bodies202612,211,702Solid body and multi-component arrangement202512,159,805Method for producing wafers with modification lines of defined orientation202412,151,314Device and method for applying pressure to stress-producing layers for improved guidance of a separation crack202412,107,017Method and apparatus for producing at least one modification in a solid body202412,030,216Method for separating wafers from donor substrates202411,869,810Method for reducing the thickness of solid-state layers provided with components202411,833,617Splitting of a solid using conversion of material202311,822,307Laser conditioning of solid bodies using prior knowledge from previous machining steps202311,787,083Production facility for separating wafers from donor substrates202311,712,749Parent substrate, wafer composite and methods of manufacturing crystalline substrates and semiconductor devices202311,664,277Method for thinning solid-body layers provided with components202311,551,981Method and apparatus for producing at least one modification in a solid body202311,407,066Splitting of a solid using conversion of material202211,309,191Method for modifying substrates based on crystal lattice dislocation density2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to SILTECTRA GMBH (12)· patent assignee history
2022–2026Based in DE· patent location history
2023–2024Patents assigned to INFINEON TECHNOLOGIES AG (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SILTECTRA GMBH | 12 | 2022–2026 |
| INFINEON TECHNOLOGIES AG | 3 | 2023–2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| DE | 15 | 2022–2026 |