Inventor
Chun-An Shih
Inventor
Tainan, TW
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices39%
C09DCoating compositions, e.g. paints, varnishes or lacquers11%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds9%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients7%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein7%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds4%
C08LCompositions of macromolecular compounds4%
G02BOptical elements, systems or apparatus4%
H01LSemiconductor devices4%
H10DInorganic electric semiconductor devices4%
PatentTitleYear
10,162,260Photosensitive resin composition, protective film, and liquid crystal display element20189,851,638Photosensitive polysiloxane composition and uses thereof20179,541,832'Photosensitive resin composition, protective film and element having the same'20179,507,261'Photosensitive composition, protective film, and element having the protective film'20169,448,474'Positive photosensitive resin composition and pattern forming method'20169,422,446'Photosensitive resin composition, protective film and element having the same'20169,395,627'Positive photosensitive resin composition and method for forming pattern by using the same'20169,389,509'Photosensitive polysiloxane composition, protecting film and element having the protecting film'20169,190,521'Positive photosensitive resin composition and uses thereof'20159,188,859'Positive photosensitive resin composition and method for forming patterns by using the same'20159,063,419'Photo-curing polysiloxane composition and application thereof'20159,063,412'Photosensitive resin composition and application of the same'20159,063,422'Photosensitive resin composition and application of the same'20159,023,589'Photosensitive resin composition and applications thereof'20158,936,891'Photosensitive polysiloxane composition and uses thereof'20158,921,024'Photosensitive polysiloxane composition and applications thereof'20148,841,050'Photosensitive resin composition and applications thereof'20148,828,640'Photo-curing polysiloxane composition and application thereof'20148,546,061'Photo-curing polysiloxane composition and protective film formed from the same'20138,349,461'Photo-curing polysiloxane composition and protective film formed from the same'2013Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2013–2018Patents assigned to CHI MEI CORP (20)· patent assignee history
2013Patents assigned to SHIH CHUN-AN (2)· patent assignee history
2013Patents assigned to WU MING-JU (2)· patent assignee history
2013–2018Based in Tainan, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CHI MEI CORP | 20 | 2013–2018 |
| SHIH CHUN-ANself | 2 | 2013 |
| WU MING-JU | 2 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tainan, TW | 20 | 2013–2018 |