Inventor

Hitoshi Hatada

Inventor

Sagamihara, JP

Overview

3→

Patents

2004–2013

Patent span

Physics

Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices60%

G01RMeasuring electric variables20%

G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein20%

PatentTitleYear

8,427,628'Exposure apparatus, exposure method and device fabricating method'2013 8,130,364'Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method'2012 6,811,953'Exposure apparatus, method for manufacturing therof, method for exposing and method for manufacturing microdevice'2004

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004–2013Patents assigned to NIKON CORP (3)· patent assignee history

2004Based in Kawasaki, JP· patent location history

2012–2013Patents assigned to HATADA HITOSHI (2)· patent assignee history

2012Patents assigned to KUMAZAWA MASATO (1)· patent assignee history

2012–2013Based in Sagamihara, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
NIKON CORP	3	2004–2013
HATADA HITOSHIself	2	2012–2013
KUMAZAWA MASATO	1	2012

Locations

Location	Patents	Span
Sagamihara, JP	2	2012–2013
Kawasaki, JP	1	2004