Inventor

Johannes Van Es

Inventor
Zwolle, NL

Overview

4→
Patents
2010–2017
Patent span
Physics
Primary field (CPC G)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
F25BRefrigeration machines, plants or systems13%
F28DHeat-exchange apparatus, not provided for in another subclass, in which the heat-exchange media do not come into direct contact13%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them13%
H05KPrinted circuits13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2016Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2010–2017Based in Zwolle, NL· patent location history
2014–2016Patents assigned to JACOBS JOHANNES HENRICUS WILHELMUS (2)· patent assignee history
2014–2016Patents assigned to OTTENS JOOST JEROEN (2)· patent assignee history
2014–2016Patents assigned to TEN KATE NICOLAAS (2)· patent assignee history
2014–2016Patents assigned to VAN ES JOHANNES (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV32010–2016
JACOBS JOHANNES HENRICUS WILHELMUS22014–2016
OTTENS JOOST JEROEN22014–2016
TEN KATE NICOLAAS22014–2016
VAN ES JOHANNESself22014–2016
Locations
LocationPatentsSpan
Zwolle, NL42010–2017