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Inventor

Willem Seine Christian Roelofs

Inventor
Deurne, NL

Overview

5→
Patents
2020–2021
Patent span
Physics
Primary field (CPC G)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices83%
G05BControl or regulating systems in general17%
PatentTitleYear
11,126,093Focus and overlay improvement by modifying a patterning device202111,029,610Lithographic method202110,962,887Lithographic method202110,877,381Methods of determining corrections for a patterning process202010,527,958Lithographic method2020

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2020–2021Patents assigned to ASML NETHERLANDS BV (5)· patent assignee history
2020–2021Based in Deurne, NL· patent location history
2021Based in Duerne, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV52020–2021
Locations
LocationPatentsSpan
Deurne, NL42020–2021
Duerne, NL12021