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Inventor

DANIEL C. GLOVER

Inventor
US

Overview

3→
Patents
2024–2025
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary
H01LSemiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
F27BFurnaces, kilns, ovens or retorts in general17%
H05BElectric heating17%
F16CShafts8%
H02KDynamo-electric machines8%
PatentTitleYear
12,341,032Methods of selective oxidation on rapid thermal processing (RTP) chamber with active steam generation202512,165,907Apparatus for rotating substrates202411,996,305Selective oxidation on rapid thermal processing (RTP) chamber with active steam generation2024

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2024–2025Patents assigned to APPLIED MATERIALS INC (3)· patent assignee history
2024–2025Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC32024–2025
Locations
LocationPatentsSpan
US32024–2025