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Inventor

Sajan Marokkey Raphael

Inventor
Singapore, SG

Overview

2→
Patents
2003–2004
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Wprimary
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1040%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
H10DInorganic electric semiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
6,730,573'MIM and metal resistor formation at CU beol using only one extra mask'20046,586,143'Accurate wafer patterning method for mass production'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2004Patents assigned to CHARTERED SEMICONDUCTOR MFG (2)· patent assignee history
2003–2004Based in Singapore, SG· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CHARTERED SEMICONDUCTOR MFG22003–2004
Locations
LocationPatentsSpan
Singapore, SG22003–2004