Inventor

KI TAE NAM

Inventor

Overview

2022–2026

Patent span

Performing operations

Primary field (CPC B)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

LOC08primary

LOC0813%

LOC2813%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry7%

B22FWorking metallic powder7%

B82BNanostructures formed by manipulation of individual atoms, molecules, or limited collections of atoms or molecules as discrete units7%

B82YSpecific uses or applications of nanostructures7%

C09KMaterials for miscellaneous applications, not provided for elsewhere7%

C25BElectrolytic or electrophoretic processes for the production of compounds or non-metals7%

G11CStatic stores7%

H01LSemiconductor devices7%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2022Patents assigned to SEOUL NAT UNIV R&DB FOUNDATION (3)· patent assignee history

2022Patents assigned to GLOBAL FRONTIER CT MULTISCALE ENERGY SYSTEMS (2)· patent assignee history

2022Patents assigned to YONSEI UNIV UNIV INDUSTRY FOUNDATION UIF (1)· patent assignee history

2022Patents assigned to YONSEI UNIV UNIV—INDUSTRY FOUNDATION UIF (1)· patent assignee history

2022–2026Based in KR· patent location history

2025–2026Patents assigned to KISS NAIL PRODUCTS INC (4)· patent assignee history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
KISS NAIL PRODUCTS INC	4	2025–2026
SEOUL NAT UNIV R&DB FOUNDATION	3	2022
GLOBAL FRONTIER CT MULTISCALE ENERGY SYSTEMS	2	2022
YONSEI UNIV UNIV INDUSTRY FOUNDATION UIF	1	2022
YONSEI UNIV UNIV—INDUSTRY FOUNDATION UIF	1	2022

Locations

Location	Patents	Span
KR	7	2022–2026