Inventor

Shizuo Fujita

Inventor
Kyoto, JP

Overview

10→
Patents
1994–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 10 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material14%
H01LSemiconductor devices14%
H10DInorganic electric semiconductor devices11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation9%
C30BSingle-crystal growth6%
H10HInorganic light-emitting semiconductor devices having potential barriers6%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution6%
B05DProcesses for applying fluent materials to surfaces, in general3%
B82YSpecific uses or applications of nanostructures3%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1994Based in Neyagawa, JP· patent location history
1994Based in Osaka, JP· patent location history
2009–2017Patents assigned to FUJITA SHIZUO (4)· patent assignee history
2009–2020Based in Kyoto, JP· patent location history
2015–2020Patents assigned to UNIV KYOTO (7)· patent assignee history
2015–2017Patents assigned to ORITA HIROYUKI (3)· patent assignee history
2015–2017Patents assigned to SHIRAHATA TAKAHIRO (3)· patent assignee history
2017–2019Patents assigned to TOSHIBA MITSUBISHI ELECTRIC INDUSTRIAL SYSTEMS CORP (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
UNIV KYOTO72015–2020
FUJITA SHIZUOself42009–2017
ORITA HIROYUKI32015–2017
SHIRAHATA TAKAHIRO32015–2017
TOSHIBA MITSUBISHI ELECTRIC INDUSTRIAL SYSTEMS CORP32017–2019
Locations
LocationPatentsSpan
Kyoto, JP82009–2020
Neyagawa, JP11994
Osaka, JP11994