Inventor
Raymond W. Jeffer
Inventor
South Burlington, VT, US
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices44%
G06FElectric digital data processing33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
Y10TTechnical subjects covered by former us classification11%
PatentTitleYear
9,996,000Test pattern layout for test photomask and method for evaluating critical dimension changes20189,989,843Test pattern layout for test photomask and method for evaluating critical dimension changes20189,372,394'Test pattern layout for test photomask and method for evaluating critical dimension changes'20167,496,885'Method of compensating for defective pattern generation data in a variable shaped electron beam system'20097,198,276'Adaptive electrostatic pin chuck'2007Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007–2018Patents assigned to IBM (5)· patent assignee history
2007–2018Based in South Burlington, VT, US· patent location history
2016–2018Patents assigned to TOPPAN PRINTING CO LTD (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 5 | 2007–2018 |
| TOPPAN PRINTING CO LTD | 3 | 2016–2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| South Burlington, VT, US | 5 | 2007–2018 |