Inventor
Katsuya Takemura
Inventor
Joetsu-shi, JP
Overview
Patents· 2 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%
C07CAcyclic or carbocyclic compounds14%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium14%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds14%
C09DCoating compositions, e.g. paints, varnishes or lacquers14%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests14%
PatentTitleYear
10,919,918Tetracarboxylic dianhydride, polyimide resin and method for producing the same, photosensitive resin compositions, patterning process, method for forming cured film, interlayer insulating film, surface protective film, and electronic parts20215,824,824'Sulfonium salts and chemically amplified positive resist compositions'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2021Patents assigned to SHINETSU CHEMICAL CO (2)· patent assignee history
1998Patents assigned to NIPPON TELEGRAPH & TELEPHONE (1)· patent assignee history
1998Based in Nishikamo-gun, JP· patent location history
2021Based in Joetsu-shi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 2 | 1998–2021 |
| NIPPON TELEGRAPH & TELEPHONE | 1 | 1998 |
Locations
| Location | Patents | Span |
|---|---|---|
| Joetsu-shi, JP | 1 | 2021 |
| Nishikamo-gun, JP | 1 | 1998 |