Inventor

Shinya Nakafuji

Inventor

Tokyo, JP

Overview

2013–2017

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices27%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds12%

B44CProducing decorative effects8%

C07DHeterocyclic compounds8%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds8%

C08LCompositions of macromolecular compounds8%

H01LSemiconductor devices8%

H05KPrinted circuits8%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2013–2017Patents assigned to JSR CORP (7)· patent assignee history

2013–2015Patents assigned to KOMURA KAZUHIKO (3)· patent assignee history

2013–2015Patents assigned to MATSUMURA YUSHI (3)· patent assignee history

2013–2015Patents assigned to MURAKAMI SATORU (3)· patent assignee history

2013–2015Patents assigned to NAKAFUJI SHINYA (3)· patent assignee history

2013–2017Based in Tokyo, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations

Location	Patents	Span
Tokyo, JP	7	2013–2017