Inventor

Shumpei Shimizu

Inventor

Tokyo, JP

Overview

1986–2021

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

Y10Sprimary

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests14%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry10%

C01BNon-metallic elements10%

C02FTreatment of water, waste water, sewage, or sludge10%

C09GPolishing compositions10%

C25BElectrolytic or electrophoretic processes for the production of compounds or non-metals10%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%

B01DSeparation5%

C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds5%

C07CAcyclic or carbocyclic compounds5%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

1986–2005Patents assigned to TAMA CHEMICALS CO LTD (6)· patent assignee history

1986–2005Based in Kawasaki, JP· patent location history

1987Patents assigned to TAMA CHEMICAL CO LTD (1)· patent assignee history

1987–1990Based in Moses Lake, WA, US· patent location history

1989–1990Patents assigned to MOSES LAKE IND INC (2)· patent assignee history

1995–2021Based in Tokyo, JP· patent location history

2002–2005Patents assigned to TOSHIBA KK (2)· patent assignee history

2021Patents assigned to SONY CORP (1)· patent assignee history

Assignee and location history derived from the patent record.

Assignees

Locations