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Inventor

Guenther Dengel

Inventor
Heidenheim, DE

Overview

7→
Patents
2010–2017
Patent span
Physics
Primary field (CPC G)

Patents· 7 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices70%
G02BOptical elements, systems or apparatus20%
F25BRefrigeration machines, plants or systems10%
PatentTitleYear
9,684,243'Blocking element for protecting optical elements in projection exposure apparatuses'20179,671,584'Method and cooling system for cooling an optical element for EUV applications'20179,041,905'Optical arrangement, in particular in a projection exposure apparatus for EUV lithography'20158,831,170'Mirror with a mirror carrier and projection exposure apparatus'20148,643,825'Microlithography illumination systems, components and methods'20147,990,520'Microlithography illumination systems, components and methods'20117,858,957'Illumination optics for projection microlithography'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2017Based in Heidenheim, DE· patent location history
2011–2017Patents assigned to ZEISS CARL SMT GMBH (6)· patent assignee history
2014–2015Patents assigned to DENGEL GUENTHER (3)· patent assignee history
2014Patents assigned to HARTJES JOACHIM (1)· patent assignee history
2015Patents assigned to EHM DIRK HEINRICH (1)· patent assignee history
2015Patents assigned to SCHMIDT STEFAN-WOLFGANG (1)· patent assignee history
2017Based in Heidenheim an der Brenz, DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ZEISS CARL SMT GMBH62011–2017
DENGEL GUENTHERself32014–2015
EHM DIRK HEINRICH12015
HARTJES JOACHIM12014
SCHMIDT STEFAN-WOLFGANG12015
Locations
LocationPatentsSpan
Heidenheim, DE62010–2017
Heidenheim an der Brenz, DE12017