Inventor

Fumiya Hirano

Inventor
Kanagawa, JP

Overview

7→
Patents
1985–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 7 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C07Dprimary
C07DHeterocyclic compounds38%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations25%
B29CShaping or joining of plastics6%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts6%
B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering6%
D02GCrimping or curling fibres, filaments, threads, or yarns6%
D10BIndexing scheme associated with sublasses of section d, relating to textiles6%
Y10TTechnical subjects covered by former us classification6%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1985–1994Patents assigned to MEIJI SEIKA KAISHA (3)· patent assignee history
1985–2021Based in Kanagawa, JP· patent location history
1992Patents assigned to MEIJI SEIKA CO (2)· patent assignee history
1992–1993Based in Yokohama, JP· patent location history
1993Patents assigned to MEIJI SEIKA KABURHIKI KAISHA (1)· patent assignee history
2021Patents assigned to MITSUBISHI GAS CHEMICAL CO (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MEIJI SEIKA KAISHA31985–1994
MEIJI SEIKA CO21992
MEIJI SEIKA KABURHIKI KAISHA11993
MITSUBISHI GAS CHEMICAL CO12021
Locations
LocationPatentsSpan
Kanagawa, JP41985–2021
Yokohama, JP31992–1993