Inventor

HOON CHAE

Inventor
KR

Overview

2→
Patents
2023–2026
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B05Bprimary
B05BSpraying apparatus14%
B08BCleaning in general14%
C01GCompounds containing metals not covered by subclasses c01d or c01f14%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices14%
G21CNuclear reactors14%
G21DNuclear power plant14%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution14%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023Patents assigned to SK HYNIX INC (1)· patent assignee history
2023–2026Based in KR· patent location history
2026Patents assigned to SEOUL NAT UNIV R&DB FOUNDATION (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SEOUL NAT UNIV R&DB FOUNDATION12026
SK HYNIX INC12023
Locations
LocationPatentsSpan
KR22023–2026