Inventor

Miwa Miyairi

Inventor

Kawasaki, JP

Overview

2001–2009

Patent span

Physics

Primary field (CPC G)

Patents· 17 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests41%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds3%

PatentTitleYear

7,501,221'Positive type resist composition and resist pattern formation method using same'2009 7,435,530'Positive type resist composition and resist pattern formation method using same'2008 7,390,612'Positive type resist composition and resist pattern formation method using same'2008 7,326,515'Positive type resist composition and resist pattern formation method using same'2008 7,323,287'Positive type resist composition and resist pattern formation method using same'2008 7,316,889'Positive type resist composition and resist pattern formation method using same'2008 7,316,888'Positive type resist composition and resist pattern formation method using same'2008 7,316,885'Method of forming resist pattern, positive resist composition, and layered product'2008 7,276,575'Process for refining crude resin for resist'2007 7,074,543'Positive resist composition and method of forming resist pattern from the same'2006 7,033,731'Multilayered body for photolithographic patterning'2006 6,936,400'Negative resist composition'2005 6,864,036'Negative-working photoresist composition'2005 6,544,712'Negative working resist composition'2003 6,455,228'Multilayered body for photolithographic patterning'2002 6,406,829'Negative-working photoresist composition'2002 6,171,749'Negative-working chemical-amplification photoresist composition'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2009Patents assigned to TOKYO OHKA KOGYO CO LTD (17)· patent assignee history

2001–2006Based in Kanagawa, JP· patent location history

2005–2009Based in Kawasaki, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TOKYO OHKA KOGYO CO LTD	17	2001–2009

Locations

Location	Patents	Span
Kawasaki, JP	11	2005–2009
Kanagawa, JP	6	2001–2006