Inventor

Jong Kyoung Park

Inventor

Hwaseong-si, KR

Overview

2009–2018

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%

C09DCoating compositions, e.g. paints, varnishes or lacquers12%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds9%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds6%

C08JWorking-up6%

C08LCompositions of macromolecular compounds6%

H01LSemiconductor devices6%

H10BElectronic memory devices6%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2009–2016Patents assigned to DONGJIN SEMICHEM CO LTD (6)· patent assignee history

2009–2011Based in Hwaseong-si, KR· patent location history

2013–2014Patents assigned to HAN MAN HO (2)· patent assignee history

2013–2014Patents assigned to KIM HYUN JIN (2)· patent assignee history

2013–2014Patents assigned to PARK JONG KYOUNG (2)· patent assignee history

2013Based in Gyeonggi, KR· patent location history

2014Based in Incheon, KR· patent location history

2016Based in Gyeonggi-do, KR· patent location history

2017–2018Patents assigned to SAMSUNG ELECTRONICS CO LTD (2)· patent assignee history

2017–2018Based in Suwon-si, KR· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations