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Inventor

Pertrus Rutgerus Bartray

Inventor
Ysselsteyn, NL

Overview

5→
Patents
2005–2009
Patent span
Physics
Primary field (CPC G)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices63%
B82YSpecific uses or applications of nanostructures13%
G02BOptical elements, systems or apparatus13%
H01JElectric discharge tubes or discharge lamps13%
PatentTitleYear
7,554,105'Lithographic apparatus and device manufacturing method'20097,078,708'Lithographic apparatus and method of manufacturing a device and method of performing maintenance'20067,061,579'Lithographic apparatus and device manufacturing method'20067,049,592'Lithographic apparatus and device manufacturing method'20066,977,713'Lithographic apparatus and device manufacturing method'2005

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005–2009Patents assigned to ASML NETHERLANDS BV (5)· patent assignee history
2005–2006Based in Ysselsteyn, NL· patent location history
2006–2009Based in Ijsselsteijn, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV52005–2009
Locations
LocationPatentsSpan
Ysselsteyn, NL32005–2006
Ijsselsteijn, NL22006–2009