Inventor
Jeffrey A. Trest
Inventor
Rochester, NY, US
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Bprimary
G02BOptical elements, systems or apparatus20%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein20%
G11BInformation storage based on relative movement between record carrier and transducer20%
B05CApparatus for applying fluent materials to surfaces, in general10%
C09KMaterials for miscellaneous applications, not provided for elsewhere10%
G03CPhotosensitive materials for photographic purposes10%
G03DApparatus for processing exposed photographic materials10%
PatentTitleYear
7,148,941'Compensator with photochemically cured barrier layer and process'20067,084,945'Compensator having particular sequence of films and crosslinked barrier layer'20066,220,943'Method and apparatus for repairing and removing scratches from photographic material surfaces'20016,172,775'Composition for repairing and removing scratches from photographic surfaces'20015,582,645'Magnetic dispersion coating apparatus having high shear regions'19965,531,827'Coating apparatus having a stagnation prevention device'19965,456,944'Magnetic dispersion coating method having high shear regions'1995Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1995–2006Patents assigned to EASTMAN KODAK CO (7)· patent assignee history
1995–2001Based in Rochester, NY, US· patent location history
2006Based in Pittsford, NY, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| EASTMAN KODAK CO | 7 | 1995–2006 |
Locations
| Location | Patents | Span |
|---|---|---|
| Rochester, New York, US | 5 | 1995–2001 |
| Pittsford, New York, US | 2 | 2006 |