Inventor
Yasuhisa Tanaka
Inventor
Tokyo, JP
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B82Yprimary
B82YSpecific uses or applications of nanostructures9%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium9%
B05DProcesses for applying fluent materials to surfaces, in general6%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds6%
G01LMeasuring force, stress, torque, work, mechanical power, mechanical efficiency, or fluid pressure6%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
Y10TTechnical subjects covered by former us classification6%
A63FCard, board, or roulette games3%
A63HToys, e.g. tops, dolls, hoops or building blocks3%
PatentTitleYear
11,060,936Physical quantity measuring device202111,050,745Information processing apparatus, authentication method, and recording medium for recording computer program202110,569,710Attention calling system and vehicle seat controlling system202010,352,809Physical quantity measuring device20197,267,730'Ferrite stainless steel for automobile exhaust system member superior in thermal fatigue strength'20076,689,488'Lead-free solder and solder joint'20045,425,988'Recording and reproducing device which includes a protective film and a monomolecular fluoro organo silicon film'19955,254,439'Light-sensitive polymer, method for preparing the same and method for forming patterns'19935,202,452'Terminal perfluoroalkylsilane compound and a process for preparing the same'19935,126,419'Light-sensitive polymer, method for preparing the same andmethod for forming patterns'19925,011,963'Terminal perfluoroalkylsilane compounds'19914,921,989'.OMEGA.silylalkynyl silane compound and method for preparation thereof'19904,734,659'Ultrasonic oscillator'19884,069,969'Automatic three stage centrifugal sludge separator'19784,000,108'Silicone resin molding compositions'1976Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1976–1995Patents assigned to SHINETSU CHEMICAL CO (7)· patent assignee history
1978Patents assigned to MITSUBISHI KAKOKI KK (1)· patent assignee history
1988Patents assigned to CHO ONPA KOGYO CO (1)· patent assignee history
1991–1995Patents assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (5)· patent assignee history
1991Based in Chiyoda-ku, JP· patent location history
1992–2021Based in Tokyo, JP· patent location history
1993–1995Based in Yokohama, JP· patent location history
2004–2020Based in Aichi, JP· patent location history
2007Based in Toyota, JP· patent location history
2019–2021Patents assigned to NAGANO KEIKI CO LTD (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 7 | 1976–1995 |
| MATSUSHITA ELECTRIC INDUSTRIAL CO LTD | 5 | 1991–1995 |
| NAGANO KEIKI CO LTD | 2 | 2019–2021 |
| CHO ONPA KOGYO CO | 1 | 1988 |
| MITSUBISHI KAKOKI KK | 1 | 1978 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 5 | 1992–2021 |
| Aichi, JP | 2 | 2004–2020 |
| Yokohama, JP | 2 | 1993–1995 |
| Toyota, JP | 1 | 2007 |
| Chiyoda-ku, JP | 1 | 1991 |