Inventor

MICHAEL EUGENE GIVENS

Inventor
US

Overview

22→
Patents
2021–2026
Patent span
Electricity
Primary field (CPC H)

Patents· 22 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
H01LSemiconductor devices23%
C23CCoating metallic material22%
H10DInorganic electric semiconductor devices15%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
PatentTitleYear
12,563,983Method of forming structures including a vanadium or indium layer202612,540,387Simultaneous selective deposition of two different materials on two different surfaces202612,543,516Methods of forming silicon germanium structures202612,482,648Selective passivation and selective deposition202512,428,723Method of forming a layer comprising magnesium, aluminum, and zinc, and related solids and systems202512,322,593Selective passivation and selective deposition202512,169,361Substrate processing apparatus and method202412,166,099Methods for forming a semiconductor device structure and related semiconductor device structures202412,094,936Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures202411,965,238Selective deposition of metal oxides on metal surfaces202411,830,732Selective passivation and selective deposition202311,798,999Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures202311,769,664Methods for depositing a hafnium lanthanum oxide film on a substrate by a cyclical deposition process in a reaction chamber202311,735,422Method of forming a photoresist underlayer and structure including same202311,695,054Methods for forming a semiconductor device structure and related semiconductor device structures202311,664,222Atomic layer deposition of indium gallium zinc oxide202311,608,557Simultaneous selective deposition of two different materials on two different surfaces202311,521,851Method of forming structures including a vanadium or indium layer202211,411,088Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures202211,227,763Methods for depositing a hafnium lanthanum oxide film on a substrate by a cyclical deposition process in a reaction chamber202211,164,955Methods for forming a semiconductor device structure and related semiconductor device structures202111,145,506Selective passivation and selective deposition2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2026Patents assigned to ASM IP HOLDING BV (22)· patent assignee history
2021–2026Based in US· patent location history
2021–2025Based in FI· patent location history
2023–2026Based in BE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASM IP HOLDING BV222021–2026
Locations
LocationPatentsSpan
US82021–2026
BE72023–2026
FI72021–2025