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Inventor

Tomoki Horigome

Inventor
New York, NY, US

Overview

2→
Patents
1991–1992
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds25%
C08LCompositions of macromolecular compounds25%
PatentTitleYear
5,087,552'Photosensitive resin composition'19924,996,132'Heat-resistant photosensitive resin composition'1991

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1991Patents assigned to TOYKO OHKA KOGYO CO LTD (1)· patent assignee history
1991Based in Kanagawa, JP· patent location history
1992Patents assigned to TOKYO OHKA KOGYO CO LTD (1)· patent assignee history
1992Based in New York, NY, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO OHKA KOGYO CO LTD11992
TOYKO OHKA KOGYO CO LTD11991
Locations
LocationPatentsSpan
New York, New York, US11992
Kanagawa, JP11991