LexDanaLexDanabeta
Inventor

David Guang-Kai Jeng

Inventor
Hsinchu, TW

Overview

3→
Patents
2001–2002
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps67%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
PatentTitleYear
6,462,483'Induction plasma processing chamber'20026,451,161'Method and apparatus for generating high-density uniform plasma'20026,319,858'Methods for reducing a dielectric constant of a dielectric film and for forming a low dielectric constant porous film'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2002Patents assigned to NANO ARCHITECT RES CORP (3)· patent assignee history
2001–2002Based in Hsinchu, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NANO ARCHITECT RES CORP32001–2002
Locations
LocationPatentsSpan
Hsinchu, TW32001–2002