Inventor
Edward M. Shamble
Inventor
Stillwater, MN, US
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1040%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1030%
G01BMeasuring length, thickness or similar linear dimensions10%
G01RMeasuring electric variables10%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices10%
PatentTitleYear
6,518,591'Contact monitor, method of forming same and method of analizing contact-, via- and/or trench-forming processes in an integrated circuit'20036,121,156'Contact monitor, method of forming same and method of analyzing contact-, via-and/or trench-forming processes in an integrated circuit'20005,911,887'Method of etching a bond pad'19995,044,750'Method for checking lithography critical dimensions'1991Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1991Patents assigned to NAT SEMICONDUCTOR CORP (1)· patent assignee history
1991–1999Based in Milpitas, CA, US· patent location history
1999–2003Patents assigned to CYPRESS SEMICONDUCTOR CORP (3)· patent assignee history
2000–2003Based in Stillwater, MN, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CYPRESS SEMICONDUCTOR CORP | 3 | 1999–2003 |
| NAT SEMICONDUCTOR CORP | 1 | 1991 |
Locations
| Location | Patents | Span |
|---|---|---|
| Stillwater, Minnesota, US | 2 | 2000–2003 |
| Milpitas, California, US | 2 | 1991–1999 |