Inventor
KEI SAKAI
Inventor
JP
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps24%
G01BMeasuring length, thickness or similar linear dimensions17%
G01NInvestigating or analysing materials by determining their chemical or physical properties14%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices14%
G06TImage data processing or generation, in general14%
G06VImage or video recognition or understanding7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
G06NComputing arrangements based on specific computational models3%
PatentTitleYear
12,505,976Charged particle beam apparatus and method for calculating roughness index202512,463,005Correction coefficient calculation device, correction coefficient calculation method, and correction coefficient calculation program202512,354,829Overlay measurement system and overlay measurement device for overlay error measurement using electron microscopy202512,347,074Pattern measurement system, pattern measurement method, and program for measuring edge roughness at the edge of a pattern based on a random noise component202512,198,327Measurement system, method for generating learning model to be used when performing image measurement of semiconductor including predetermined structure, and recording medium for storing program for causing computer to execute processing for generating learning model to be used when performing image measurement of semiconductor including predetermined structure202511,791,130Electron beam observation device, electron beam observation system, and image correcting method and method for calculating correction factor for image correction in electron beam observation device202311,670,481Charged particle beam device202311,626,266Charged particle beam device202311,177,112Pattern measurement device and non-transitory computer readable medium having stored therein program for executing measurement2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to HITACHI HIGH TECH CORP (9)· patent assignee history
2021–2025Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI HIGH TECH CORP | 9 | 2021–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 9 | 2021–2025 |