Inventor
Hitoshi Sugahara
Inventor
Tokyo, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps19%
H01LSemiconductor devices19%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
G01BMeasuring length, thickness or similar linear dimensions11%
G01NInvestigating or analysing materials by determining their chemical or physical properties11%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%
G06TImage data processing or generation, in general11%
PatentTitleYear
10,558,127Exposure condition evaluation device202010,445,875Pattern-measuring apparatus and semiconductor-measuring system201910,190,875Pattern measurement condition setting device and pattern measuring device20199,990,708Pattern-measuring apparatus and semiconductor-measuring system20188,959,461'Pattern measurement device and pattern measurement method'20158,942,464'Pattern measuring apparatus, and pattern measuring method and program'2015Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2015–2020Patents assigned to HITACHI HIGH TECH CORP (6)· patent assignee history
2015Patents assigned to HOJO YUTAKA (2)· patent assignee history
2015Patents assigned to OIKAWA MICHIO (2)· patent assignee history
2015Patents assigned to SHIBAHARA TAKUMA (2)· patent assignee history
2015Patents assigned to SHINDO HIROYUKI (2)· patent assignee history
2015–2020Based in Tokyo, JP· patent location history
2015Based in Hitachioota, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI HIGH TECH CORP | 6 | 2015–2020 |
| HOJO YUTAKA | 2 | 2015 |
| OIKAWA MICHIO | 2 | 2015 |
| SHIBAHARA TAKUMA | 2 | 2015 |
| SHINDO HIROYUKI | 2 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 5 | 2015–2020 |
| Hitachioota, JP | 1 | 2015 |