Inventor
Kenji Otsuka
Inventor
Kanagawa, JP
Overview
Patents· 39 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B01Dprimary
B01DSeparation17%
B41JTypewriters8%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry6%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds5%
C23CCoating metallic material5%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein4%
G08CTransmission systems for measured values, control or similar signals4%
G09GArrangements or circuits for control of indicating devices using static means to present variable information4%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
Y02PClimate change mitigation technologies in the production or processing of goods4%
PatentTitleYear
10,377,135Electronic device, liquid ejection head, and method of manufacturing electronic device201910,287,420Thermal expansion resin composition201910,189,259Joining method, apparatus of manufacturing joined body, joined body, ink jet head unit, and ink jet type recording apparatus201910,005,279Method for manufacturing MEMS device, MEMS device, liquid ejecting head, and liquid ejecting apparatus201810,007,975Image processing device and GUI configuration command method for image processing device20189,994,693Thermally expandable resin composition20189,789,691'Joining method, apparatus of manufacturing joined body, joined body, ink jet head unit, and ink jet type recording apparatus'20178,188,842'Stationary remote control transmitter'20128,138,942'Remote control transmitting device'20128,128,202'Nozzle plate, method for manufacturing nozzle plate, droplet discharge head, and droplet discharge device'20128,068,013'RF communication module and RF communication system'20118,029,110'Droplet ejection head and droplet ejection apparatus'20118,029,111'Droplet ejection head and droplet ejection apparatus'20117,936,142'Portable drilling device'20117,868,984'Electro-optical device and method of manufacturing the same'20117,333,169'Electro-optical device and method of manufacturing the same'20087,328,874'Supporting device for non-averaged force'20087,297,315'Method of recovering a cleaning agent'20077,195,022'Production apparatus for producing gallium nitride semiconductor film and cleaning apparatus for exhaust gas'20076,960,552'Decompositionally treating agent and decompositionally treating method for fluorocarbons'20056,762,813'Electro-optical device and method of manufacturing the same'20046,749,819'Process for purifying ammonia'20046,716,403'Method of recovering a cleaning agent'20046,638,489'Cleaning process and cleaning agent for harmful gas'20036,579,509'Method of cleaning of harmful gas and cleaning apparatus'20036,447,576'Cleaning agent and cleaning process of harmful gas'20026,429,843'Electro-optical device'20026,331,281'Process and apparatus for cleaning exhaust gas'20016,325,841'Purifying agent and purification method for halogen-containing exhaust gas'20016,261,345'Process and apparatus for recovering ammonia'20016,175,348'Electro-optical device'20015,956,009'Electro-optical device'19995,935,540'Cleaning process for harmful gas'19995,895,521'Dust removing apparatus and dust removing method'19995,882,615'Cleaning agent and cleaning process for harmful gas'19995,756,060'Process for cleaning harmful gas'19985,670,445'Cleaning agent of harmful gas and cleaning method'19975,589,148'Process for purifying halogen-containing gas'19965,489,327'Process for purifying hydrogen gas'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–2007Patents assigned to JAPAN PIONICS (17)· patent assignee history
1996–1999Based in Hiratsuka, JP· patent location history
1997–2018Based in Kanagawa, JP· patent location history
1999–2011Patents assigned to SEMICONDUCTOR ENERGY LAB (6)· patent assignee history
2011–2019Patents assigned to SEIKO EPSON CORP (7)· patent assignee history
2011–2012Patents assigned to OTSUKA KENJI (4)· patent assignee history
2011–2012Patents assigned to SMK KK (3)· patent assignee history
2011–2019Based in Suwa, JP· patent location history
2011–2012Based in Tokyo, JP· patent location history
2017–2019Based in Chino, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| JAPAN PIONICS | 17 | 1996–2007 |
| SEIKO EPSON CORP | 7 | 2011–2019 |
| SEMICONDUCTOR ENERGY LAB | 6 | 1999–2011 |
| OTSUKA KENJIself | 4 | 2011–2012 |
| SMK KK | 3 | 2011–2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 21 | 1997–2018 |
| Suwa, JP | 4 | 2011–2019 |
| Tokyo, JP | 4 | 2011–2012 |
| Hiratsuka, JP | 4 | 1996–1999 |
| Chino, JP | 3 | 2017–2019 |