Inventor
Dennis J. Massa
Inventor
Pittsford, NY, US
Overview
Patents· 27 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Lprimary
C08LCompositions of macromolecular compounds11%
C08JWorking-up10%
C09KMaterials for miscellaneous applications, not provided for elsewhere10%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein10%
G03CPhotosensitive materials for photographic purposes10%
B41MPrinting, duplicating, marking, or copying processes9%
Y10TTechnical subjects covered by former us classification9%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds7%
G02BOptical elements, systems or apparatus6%
G03GElectrography4%
PatentTitleYear
8,940,362'Method for manufacturing porous particles with non-porous shell'20158,652,637'Porous particles with non-porous shell'20148,058,335'Wax dispersions for toners'20117,754,409'Toner manufacturing method'20107,666,815'Thermal donor for high-speed printing'20107,494,704'Material, article and method of preparing materials containing oriented anisotropic particles'20097,327,422'Optical compensation film, display, and process'20087,273,830'Thermal donor for high-speed printing'20077,244,691'Thermal print assembly'20077,211,316'Optical multilayer'20077,163,724'Multilayer optical compensator, liquid crystal display, and process'20077,083,835'Multilayer optical compensator, liquid crystal display, and process'20066,972,139'Thermal donor'20056,964,795'Multilayer optical compensator, liquid crystal display, and process'20056,937,310'Compensation films for LCDs'20056,853,424'Liquid crystal cell with compensator layer and process'20056,797,458'Photographic multi-layer film base comprising 1,4-cyclohexane dimethanol'20046,767,952'Article utilizing block copolymer intercalated clay'20046,670,110'Photographic multilayer film base comprising 1,4-cyclohexane dimethanol'20036,558,884'Photographic film base comprising a poly(ethylene terephthalate)-based material'20036,475,696'Imaging elements with nanocomposite containing supports'20025,925,507'Photographic film base and photographic elements'19995,916,740'Photographic film base and photographic elements'19995,302,662'Compatible polyamide blends'19945,276,089'Compatible polyester blends'19945,250,624'Miscible blends of polyamides and vinylphenol containing polymers'19935,235,001'Polyester/polyphenylene ether blends'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–2015Patents assigned to EASTMAN KODAK CO (25)· patent assignee history
1993–2015Based in Pittsford, NY, US· patent location history
2011–2015Patents assigned to MASSA DENNIS J (3)· patent assignee history
2011–2015Patents assigned to NAIR MRIDULA (3)· patent assignee history
2014–2015Patents assigned to HAMILTON DALE E (2)· patent assignee history
2014–2015Patents assigned to JONES TAMARA K (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| EASTMAN KODAK CO | 25 | 1993–2015 |
| MASSA DENNIS Jself | 3 | 2011–2015 |
| NAIR MRIDULA | 3 | 2011–2015 |
| HAMILTON DALE E | 2 | 2014–2015 |
| JONES TAMARA K | 2 | 2014–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Pittsford, New York, US | 27 | 1993–2015 |